Form sediment of chemical gas phase is accumulated [CVD(Chemical Vapor Deposition)] , show a steam that contains the gaseous reaction lotion that makes filmy element or agent of liquid state reaction and reaction place need other gas to introduce reative cell, chemical reaction happens to build filmy course in underlay surface. Very much in VLSI film is to use CVD method preparation.

CVD characteristic: Temperature of form sediment accumulating is low, filmy component accuses easily, film is deep with form sediment accumulating time becomes direct ratio, uniformity, repeatability is good, step enclothes a gender admirable.

Previous:Vacuum food
Next:no article