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Magnetism accuses to splash fire capable person of plated film target
From;    Author:Stand originally
Magnetism accuses to splash shooting plated film is means of a kind of new-style plated film of physical gas phase, than relatively of breakfast evaporate plated film means, its the advantage of a lot of respects is quite clear. As a relatively mature technology that has developed, magnetism accuses to splash shoot had been applied at a lot of domains.

Magnetism accuses to splash shoot a principle: The target that is being splashed to shoot extremely (cathode) with an orthogonality magnetic field and electric field are increased between positive pole, the inert gase that fills a need in high vacuum room (enrage) for Ar normally, permanent magnet forms 250 ~ in target material surface the magnetic field of 350 gauss, comprise orthogonal electromagnetism field with high-pressured electric field. Below the action of electric field, ar gas ionization is become ion and electron, the negative maximum pressure with have constant is increased on target, from target extremely the ionization odds of the effect that the electron that give out suffers magnetic field and working gas increases, the plasma of high density is formed around cathode, ar ion flies to target range quickly below the action of Lorentz force, with range of very tall speed bombard target, the atom that makes be splashed to be shot on target abides by momentum to change a principle to break away from target range to fly to with higher kinetic energy base piece form sediment accumulates film. Magnetism accuses to splash shoot general component to be 2 kinds: Affluent is splashed shoot and radio frequency is splashed shoot, among them affluent is splashed shoot equipment principle simple, splashing when shooting a metal, its rate is rapid also. And radio frequency splashs ejaculation scope of application more extensive, except can splash outside shooting conductor, also can splash shoot non-conductive n material, return department to undertake reacting splashing ejaculation the compound material such as preparation oxide, nitride and carbide at the same time. Microwave plasma is become to splash after the frequency that is like radio frequency rises shoot, have an electron commonly usedly at present whirly resonance (ECR) microwave plasma is splashed shoot.

Magnetism accuses to splash fire capable person of plated film target:

The metal is splashed fire capable person of plated film target, alloy is splashed fire capable person of plated film target, pottery and porcelain is splashed fire capable person of plated film target, boride pottery and porcelain splashs material ejaculation target, carbide pottery and porcelain splashs material ejaculation target, fluoride pottery and porcelain splashs material ejaculation target, nitride pottery and porcelain splashs material ejaculation target, material of target of oxide pottery and porcelain, selenium changes content pottery and porcelain to splash material ejaculation target, silicon changes content pottery and porcelain to splash material ejaculation target, sulfide pottery and porcelain splashs material ejaculation target, telluride pottery and porcelain splashs material ejaculation target, material of target of other pottery and porcelain, mix into chromium oxidizes material of target of silicon pottery and porcelain (Cr-SiO) ,
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